I. Definition and Scope of UHV

Definition: 'UHV' is an abbreviation for Ultra-High Vacuum, which is translated as 'ultra-high vacuum' in Chinese. 

It typically refers to a vacuum environment with a pressure lower than 10⁻⁷ Pa (1 Pa ≈ 7.5×10⁻³ mTorr).

Scope of Application: As a core technical foundation for modern industry and cutting-edge scientific research,

 it is widely used in semiconductor manufacturing (such as chip etching, thin film deposition), vacuum coating 

(optical lenses, aerospace components), particle physics experiments, and materials surface science research. 

The core goal is to minimize the interference of gas molecules with process precision or experimental results, 

such as preventing material oxidation and reducing particle collision errors.

Core Technical Pain Points and Solutions of UHV Systems

To implement and maintain the UHV environment, it is necessary to break through the five core technologies of 'pumping speed, outgassing, sealing, control logic, and connection adaptation'.

Pumping speed：How to quickly reach the target vacuum level and maintain stable efficiency when switching between multiple workstations

Question: Multi-station parallel operations are prone to vacuum resource conflicts, causing a sharp drop in vacuum level during station switching, making it difficult to balance 'fast pumping' and 'stable efficiency'; additionally, insufficient stability after equipment movement can easily affect pumping performance.

Solution approaches

Equipment Configuration: Staged Vacuum Pumping System Configuration: It adopts a 'mechanical pump + molecular pump' staged vacuum pumping architecture to meet the speed requirements at different stages. Start the mechanical pump, delay opening the fore-vacuum valve, wait until the fore-vacuum meets the start-up requirements of the molecular pump, then start the molecular pump. When the molecular pump reaches its rated speed, it indicates that the molecular pump has started successfully.

Outgassing：How to thoroughly remove adsorbed gases to prevent contamination of the vacuum environment

Question: System materials and workpiece surfaces are prone to adsorbing water vapor and organic volatile substances, which are easily released at

 high temperatures; for some workpieces (such as metal tubes), the ends with thicker walls and higher strength are difficult to thoroughly degas

 with conventional heating methods, posing a risk of vacuum contamination.

Solution approaches

Outgassing Process: Bell Jar Heating + Pipeline Outgassing

When the vacuum level in the ultra-high vacuum (UHV) pipeline reaches the set value, the pipeline temperature control system is activated to

 bake and outgas the pipeline. Baking at 450°C to 500°C for several hours releases water vapor and hydrocarbons adsorbed on the material surface,

 laying the foundation for the UHV environment.

Sealing Performance：How to Prevent Air Leakage and Maintain Stable Vacuum Environment

Issue: Equipment vibration, chamber lifting offset, vacuum pump vibration, etc., are prone to cause interface leakage, wear of sealing components, 

infiltration of external gas or internal gas leakage, which will destroy the UHV environment.

Solution approaches

Graded Sealing: The high vacuum section (from the molecular pump to the workstation) employs full metal sealing (such as VAT CF35 full metal

 workstation valve), while the low vacuum section (from the dry pump to the forepump valve) uses gasket flange sealing, balancing sealing

 performance with maintenance convenience.

• After workpiece installation, interface leak detection is performed using a helium mass spectrometer. Valves are selected as full metal valves with

 a service life of thousands of cycles (such as CF16 vent valve) to reduce the risk of seal failure after long-term use.

Connection Adaptation：How to ensure compatibility with multiple devices and avoid connection misalignment issues

Problem: The position of the connection pipe is fixed, making it unable to adapt to the connection port positions of different devices; 

when multiple workstations connect simultaneously, misalignment is easy to occur. After device movement, stability is poor, which affects the 

sealing and vacuum extraction effects.

Solution approaches

Interface Adaptation: Workstation Interface + Accessory Adaptation

Each workstation is equipped with a vacuum interface (compatible with lead shield) and a workstation valve interface, supporting independent 

vacuum pumping of the lead shield. It comes with vacuum corrugated hoses (customized on-site according to dimensions) and standard 

connectors, meeting installation requirements for workpieces of different specifications.

Fluid Path Adaptation: Water Circuit + Air Circuit

Water Circuit: Both the bell jar and base are welded with water lines, and a pressure controller is provided to achieve under-pressure alarm for the

 water circuit.

Air Circuit: A three-in-one unit is configured to adjust the drive air source pressure. 

The high-pressure chamber is equipped with aging oil pipes and high-voltage cables.

Control Logic：How to linkage adjustment to ensure stable vacuum at multiple workstations

In multi-station scenarios, the coordination between equipment such as vacuum pumps and valves is poor. When pressure fluctuations occur,

 the suction power cannot be adjusted in a timely manner, and station switching is prone to cause a sharp drop in vacuum level, 

affecting process accuracy.

Solution approaches

Core Control Architecture: It adopts a three-layer control system of 'PLC + Industrial Computer + Configuration Software' to achieve dual-mode 

operation of automatic and manual. The PLC and industrial computer can expand communication modules to realize data interaction with vacuum 

gauges and temperature control systems. The configuration software can display vacuum degree and temperature data in real time, 

generate historical trend curves, support data storage (exportable to Excel), and over-limit alarms (over-temperature, vacuum abnormalities).

Beier Super Vacuum Exhaust Table

Product Highlights

High Ultimate Vacuum: Beier's system achieves an extremely high ultimate vacuum, up to the 10^-8 Pa level, which is essential for many

                  high-precision processes.

Stability and Reliability: The equipment is equipped with internationally advanced components to ensure stable performance and high reliability. 

The oil-free design eliminates oil contamination, which is crucial for maintaining an ultra-high vacuum environment.

Multi-Station Design: To improve production efficiency, our ultra-precision vacuum exhaust platform features multiple pumping stations.

 Customized connection interfaces can be provided according to customer requirements.

User-Friendly Operation Interface: The touch screen display and arbitrary setting of electrical control parameters make operation more convenient. 

It also facilitates user data storage and process debugging.

Complete Baking Functions: The system includes easy-to-operate oven heating with temperature display and adjustable baking temperature,

 reaching a maximum of 450°C-500°C.

Customization Services: Based on the needs of different industries and customers, the ultra-high vacuum exhaust platform can offer customized services to 

adapt to specific process requirements.